Horizontal inline sputtering system

Features and description

  • Ideal for R & D and production
  • Horizontal carrier arrangement
  • Modular and very flexible design
  • Additional, modular process chambers
  • Loading and unloading station on one or both sides
  • Pre-treatment by glowing, heating and etching
  • DC, pulsed DC, MF and RF sputtering
  • Precise drive system with positioning function
  • Sweep mode, run mode, stationary mode
  • Replaceable cathode modules planar & rotatable
  • Process sequence fully automatic
  • Recipe management and process visualization
  • Data management for process documentation
  • Effective vacuum pump system
  • System-specific substrate sizes:
    • 1000 mm x 400 mm x 35 mm
    • 1000 mm x 600 mm x 35 mm
    • 1000 mm x 800 mm x 35 mm

Description of a typical application

The term sputtering is a physical process in which atoms are released from a solid (target) by bombardment with high-energy ions (predominantly noble gas ions) and then transferred to the gas phase.

The term sputtering is usually understood to mean only the sputter deposition, a high-vacuum-based coating technique belonging to the group of PVD processes. Furthermore, sputtering is used in surface physics as a cleaning method for the preparation of high-purity surfaces and as a method for analyzing the chemical composition of surfaces.

The DELTALINE series is a very flexible R & D and production system for such thin-film processes.

DELTALINE 10X0H - Technical Data

Substrate dimensions
1000 x 400 x 35 mm - (DELTALINE 1040H)
1000 x 600 x 35 mm - (DELTALINE 1060H)
1000 x 800 x 35 mm - (DELTALINE 1080H)
Substrate weight, max.
50 kg
Carrier orientation
Speed range
0.2 ... 10 m/min
High vacuum pumps
Turbo-molecular pumps
Temp. pre-treatment
20 ... 350 °C
Plasma pre-treatment
Glowing/ etching
Ultimate vacuum
< 2 x 10^-6 mbar
Sputtering cathode
Planar / tube cathode
Sputtering modes
DC / DC pulsed / MF / RF
Power per cathode
5 ... 20 kW
Metals / alloys / multilayers / oxides
No. of process chambers
1 ... 3
Process chamber material
stainless steel 1.4301
Dimensions (L x W x H), ca.
5900* x 2500 x 2000 mm - (DELTALINE 1040H)
5900* x 3000 x 2000 mm - (DELTALINE 1060H)
5900* x 3500 x 2000 mm - (DELTALINE 1080H)
* Length depends on configuration

* Other machine sizes and specifications on request

Product information (PDF):


HS-Group GmbH
Porschestrasse 12
63512 Hainburg

Tel. +49 6182 - 93 51 0
Fax +49 6182 - 93 51 11


We use cookies on our website. Some of them are essential for the operation of the site, while others help us to improve this site and the user experience (tracking cookies). You can decide for yourself whether you want to allow cookies or not. Please note that if you reject them, you may not be able to use all the functionalities of the site.