2017 »»»
New company name HS-Group GmbH
2014 »»»
Due to the takeover of a group of investors, the company was renamed to HS-PlasmaTec GmbH
2011 »»»
Move to new premises in 63512 Hainburg, Germany.
Production and office space 360 m2
2007 »»»
Realignment of the company for beam analysis with micro-system technology
2006 »»»
Further development of plasma jet sources for linear systems; patent applications
2005 »»»
Worldwide retrofitting of the Circulus systems for the separation of thin carbon layers by using PBS plasma sources. Further development of PBS plasma sources for ion support in high vacuum by means of fluoric substances for the DUV/VUV range 193 nm
2004 »»»
Production of the first industrial plant for the production of micro arrays for gas analysis
2003 »»»
Start of transfer of the C Gun for the separation of thin carbon layers in industrial production
2002 »»»
Relocation of the company’s headquarters to Kleinwallstadt, Germany. Further intensified cooperation with Jakob Vakuumtechnik
2001 »»»
Construction of a 1 m ion source for the separation of SiO2 layers for industrial production of gas sensor micro arrays
2000 »»»
Project start for the development of state-of-the-art sensors for gas analysis
1999 »»»
Merger with the Jakob Group and increased cooperation with Jakob Vakuumtechnik
1998 »»»
Redesign of inductively coupled RF ion sources with variable steel geometry (ECWR = Electron Cyclotron Wave Resonance); "First of the First" linear ion source with 30 cm beam geometry and 3-times extraction grid
1996 »»»
First experiments on the industrial separation of ultra-thin carbon films using plasma jet sources (PE-CVD process)
1994 »»»
Production of the world's first plasma source with a neutral plasma jet; Operating principle: “Self-biasing effect” by Prof. Dr. Hans Oechsner
1993 »»»
Inception as "Start up" of the University of Kaiserslautern, Germany