DELTALINE

DELTALINE-V

Vertical inline sputtering system

  • DELTALINE-V Inline mit Autolader

    DELTALINE-V Inline coater with carrier magazine

  • DELTALINE-V Pumpenseite

    DELTALINE-V Pumping side

  • DELTALINE-V Batch mit Autolader

    DELTALINE-V Batch with carrier magazine

  • DELTALINE-V Inline manuelle Beladung

    DELTALINE-V Inline manual loading

  • DELTALINE-V Inline manuelle Beladung

    DELTALINE-V Batch manual loading

  • DELTALINE-V Autolader

    DELTALINE-V carrier magazine

  • DELTA<span style="color: #ff0000;">L</span>INE-V Inline coater with carrier magazine
  • DELTA<span style="color: #ff0000;">L</span>INE-V Pumping side
  • DELTA<span style="color: #ff0000;">L</span>INE-V Batch with carrier magazine
  • DELTA<span style="color: #ff0000;">L</span>INE-V Inline manual loading
  • DELTA<span style="color: #ff0000;">L</span>INE-V Batch manual loading
  • DELTA<span style="color: #ff0000;">L</span>INE-V carrier magazine

Features and description

  • Ideal for R&D and production
  • Vertical carrier arrangement
  • Modular and very flexible design
  • Additional, modular process chambers
  • Carrier magazine on one or both sides
  • Pre-treatment by glowing, heating and etching
  • DC, pulsed DC, MF and RF sputtering
  • Precise drive system with positioning function
  • Sweep mode, run mode, stationary mode
  • Automatic substrate changer
  • Measurement systems such as RGA, PEM, pyrometer
  • Replaceable cathode modules (planar & rotatable)
  • Co-sputtering
  • Fully automatic process sequence
  • Recipe management and process visualization
  • Data management for process documentation
  • Efficient vacuum system
  • System-specific substrate sizes:
    • 400 mm x 400 mm x 15 mm
    • 600 mm x 600 mm x 15 mm
    • 800 mm x 800 mm x 15 mm

DELTALINE-V Specifications

Substrate dimensions
400 x 400 x 15 mm - (DELTALINE 440 V)
600 x 600 x 15 mm - (DELTALINE 660 V)
800 x 800 x 15 mm - (DELTALINE 880 V)
Substrate weight, max.
30 kg
Carrier orientation
vertical
Speed range
0.2 ... 10 m/min
High vacuum pumps
Turbomolecular pumps, cryogenic pumps
Pre-treatment temperature range
20 ... 350 °C
Plasma pre-treatment
Glowing / etching
Ultimate vacuum
< 1 x 10^-6 mbar
Sputtering cathodes
Planar / tube cathodes / co-sputtering
Sputtering modes
DC / pulsed DC / MF / RF
Additional processes
PECVD Prozesse
Layers
Metals / alloys / multilayers / oxides
No of process chambers
1 ... 5
Process chamber material
Stainless steel 1.4301
Dimensions
*depends on configuration

* Other machine sizes and specifications on request

ADDRESS

HS-Group GmbH
Porschestrasse 12
63512 Hainburg
Germany

Tel. +49 6182 - 93 51 0
Fax +49 6182 - 93 51 11

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