A round plasma source for multifunctional use in different system types. This type of source is very well dimensioned and can be adapted to the hardware. This is also the physically and mechanically most favorable form.
The QUATRON-R can be used for etching, coating, supporting with vapor deposition coatings or magnetron coatings, production of oxide layers.
Advantages of the source:
Ion energy in the beam: 20 to ~2,000 eV
Beam current: up to ~ 6 mA/cm²
Very mono-chrome energy distribution in the respective pressure range
Neutral beam (no static charge from the substrate)
Plasma operation with ALL possible gases
Plasma operation with several gases simultaneously with the mixture (initial contact) in the plasma
No process contamination. (Stability and reproducibility)
Coatings “from the source”. For example, in DLC processes, the C+ atoms are processed in the source.
QUATRON-R - technical data
80 mm (QUATRON-R 80) 200 mm (QUATRON-R 200) 300 mm (QUATRON-R 300) 450 mm (QUATRON-R 450)