round plasma source
A round plasma source for multifunctional use in different system types. This type of source is very well dimensioned and can be adapted to the hardware. This is also the physically and mechanically most favorable form.
The QUATRON-R can be used for etching, coating, supporting with vapor deposition coatings or magnetron coatings, production of oxide layers.
Advantages of the source:
Coatings “from the source”. For example, in DLC processes, the C+ atoms are processed in the source.
Beam area, ca.
Energy up to
Current density, up to
* Other QUATRON-R sizes and specifications on request
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